STjh semiconductor EFEM mini-environment with two load ports, central robot window and roof filter modules

STJH-SEMICONDUCTOR-MINI-ENVIRONMENT-2PORT

Semiconductor Mini-Environment Two-Load-Port

A compact two-port equipment front-end mini-environment built around one atmospheric wafer-transfer robot.

Two carrier load ports
Single atmospheric transfer robot
Compact positive-pressure mini-environment

商品紹介

This compact EFEM configuration supports two load ports around a single atmospheric robot and aligner. Positive-pressure ultra-clean airflow protects opened carriers and wafers during horizontal transfer between the ports and process tool. The two-port layout minimizes tool-front width for metrology or lower-throughput processes.

主要な特徴

Reduced tool-front width

Two ports provide source and destination positions without the span of larger EFEMs.

Protected wafer handling

Ultra-clean positive airflow surrounds horizontal robotic transfer outside the carrier.

Standards-oriented interface

The front end can be arranged around SEMI-compatible carriers and tool interfaces.

技術的なパラメータ

Load Ports	Two
Environment	Positive-pressure ultra-clean mini-environment
Wafer Handling	Horizontal atmospheric robotic transfer
Robot Count	One
Aligner	Integrated option
Carrier Interface	SEMI-standard compatible
Carrier Type	FOUP or cassette by process
Loading	Manual or automated interface
Typical Tool	Compact process or metrology system
カスタマイズ	意図したアプリケーションと動作環境に基づいて利用できます。

Applications

For compact semiconductor process or metrology tools requiring two FOUP or cassette positions. Port pitch, robot reach and tool handoff must be coordinated as one automation envelope.

Solutions for Your Application

A three- or four-port EFEM makes the tool front unnecessarily wide.Use two load ports for the minimum source-and-destination arrangement.

Exposed wafer transfer risks particle deposition.Maintain the positive ultra-clean mini-environment around the atmospheric robot.

利用可能なオプション

Configure load-port standard, aligner, carrier ID, ionization, robot reach and automation interface. Final geometry follows the process tool.

Planning a Semiconductor Mini-Environment Two-Load-Port specification?

寸法、設置条件、性能目標、必要な表面仕上げをお送りください。

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