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STJH-SEMICONDUCTOR-MINI-ENVIRONMENT-2PORT

Semiconductor Mini-Environment Two-Load-Port

A compact two-port equipment front-end mini-environment built around one atmospheric wafer-transfer robot.
  • Two carrier load ports
  • Single atmospheric transfer robot
  • Compact positive-pressure mini-environment
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Введение продукции

This compact EFEM configuration supports two load ports around a single atmospheric robot and aligner. Positive-pressure ultra-clean airflow protects opened carriers and wafers during horizontal transfer between the ports and process tool. The two-port layout minimizes tool-front width for metrology or lower-throughput processes.

Основные характеристики

Reduced tool-front width

Two ports provide source and destination positions without the span of larger EFEMs.

Protected wafer handling

Ultra-clean positive airflow surrounds horizontal robotic transfer outside the carrier.

Standards-oriented interface

The front end can be arranged around SEMI-compatible carriers and tool interfaces.

Технические параметры

Load PortsTwo
EnvironmentPositive-pressure ultra-clean mini-environment
Wafer HandlingHorizontal atmospheric robotic transfer
Robot CountOne
AlignerIntegrated option
Carrier InterfaceSEMI-standard compatible
Carrier TypeFOUP or cassette by process
LoadingManual or automated interface
Typical ToolCompact process or metrology system
CustomizationДоступно в зависимости от предполагаемого применения и операционной среды.

Applications

For compact semiconductor process or metrology tools requiring two FOUP or cassette positions. Port pitch, robot reach and tool handoff must be coordinated as one automation envelope.

Solutions for Your Application

A three- or four-port EFEM makes the tool front unnecessarily wide.Use two load ports for the minimum source-and-destination arrangement.
Exposed wafer transfer risks particle deposition.Maintain the positive ultra-clean mini-environment around the atmospheric robot.

Доступные варианты

Configure load-port standard, aligner, carrier ID, ionization, robot reach and automation interface. Final geometry follows the process tool.

Planning a Semiconductor Mini-Environment Two-Load-Port specification?

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