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STJH-SEMICONDUCTOR-MINI-ENVIRONMENT-4PORT

Semiconductor Mini-Environment Four-Load-Port

The largest cited EFEM load-port configuration for maximum FOUP staging at high-throughput process tools.
  • Four carrier load ports
  • Maximum series buffering
  • Carrier ID and ionizer options
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Perkenalan produk

This four-port EFEM provides the greatest carrier-buffer capacity in the series. The positive-pressure ultra-clean front end supports carriers holding up to 25 wafers on the cited platform and can add carrier identification or ionizers. Its wider port face suits high-throughput tools where queue availability outweighs floor-space constraints.

Fitur utama:

High-throughput staging

Four ports maintain multiple source, destination and queued carriers at the tool front.

Carrier traceability option

Identification hardware can associate incoming carriers with the automation sequence.

Static-control option

Ionizers can reduce charge around open-carrier and wafer-transfer areas.

Parameter teknis

Load PortsFour
EnvironmentPositive-pressure ultra-clean mini-environment
Carrier CapacityUp to 25 wafers per carrier on cited platform
Wafer HandlingAtmospheric robotic transfer
Carrier InterfaceSEMI-compatible
BufferingMaximum four-port arrangement
Carrier IdentificationOptional
IonizationOptional
Typical UseHigh-throughput process-tool front end
Customization (Kustomisasi)Tersedia berdasarkan aplikasi yang dimaksudkan dan lingkungan operasi.

Applications

For high-throughput semiconductor tools requiring maximum FOUP staging. Confirm port spacing, factory-automation clearance and robot cycle logic within the expanded front-end width.

Solutions for Your Application

Carrier delivery delays leave the process tool waiting for the next lot.Use four ports to increase queued source and destination capacity.
More staged carriers complicate identity and static control.Add carrier identification and ionization suited to the automation plan.

Pilihan yang tersedia

Configure load ports, carrier ID, ionizers, aligner, robot, AGV/OHT interfaces and tool controls. Final front-end width follows port pitch and service clearances.

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