クリーンルーム機器と無菌施設の必需品のワンストップサプライヤー国際プロジェクト支援
Open mobile navigationClose mobile navigation
ホーム / 製品 / Cleanroom Air Filters / Targeted Molecular Chemical Filter Base AMC
STJH-TARGETED-MOLECULAR-FILTER-BASES

Targeted Molecular Chemical Filter Base AMC

A base-selective cleanroom header filter for ammonia and amines in lithography and other sensitive processes.
  • Ammonia and amine control
  • Base-selective adsorbent
  • Low-outgassing cleanroom format
見積もりリクエスト 製品案内

商品紹介

This model is organized around airborne bases, particularly ammonia and amines, rather than VOC or acid duty. Base-target ion-exchange resin or an appropriately impregnated adsorbent is held in a pleated cleanroom-compatible structure inside a metal header frame. The configuration suits make-up and recirculation air serving processes where very low base levels matter. Media capacity is site-dependent, so the inlet challenge and required end-of-life removal level should be established before sizing.

主要な特徴

Base-specific capture path

Ion-exchange or impregnated media is chosen for ammonia and amines, avoiding the poor selectivity that can result from using untreated general-purpose carbon.

Pleated high-area construction

Embedding the chemical media in a structured nonwoven creates working surface area in a compact headered element for common AHU sections.

Sensitive-process compatibility

Controlled outgassing and particle release support placement upstream of critical final filters in semiconductor clean-air systems.

技術的なパラメータ

Primary Contaminant ClassAmmonia, amines and basic AMC
AdsorbentBase-target ion-exchange resin or impregnated adsorbent
Media ConstructionPleated embedded-adsorbent nonwoven
Frame FormatMetal header filter
Installation PositionMake-up-air or recirculation-air unit
Access CompatibilityFront-loaded or side-access housing
Cleanliness AttributesLow-outgassing, high-cleanliness components
Downstream ProtectionCompatible with separately specified HEPA or ULPA stage
Service-Life BasisBase concentration, humidity, airflow and end-point efficiency
カスタマイズ意図したアプリケーションと動作環境に基づいて利用できます。

Applications

Selected for photolithography, reticle handling and other semiconductor spaces where ammonia or amines can change resist chemistry or contaminate surfaces. It can also serve clean chemical areas after the specific base challenge has been characterized.

Solutions for Your Application

A VOC-grade carbon element may offer inadequate ammonia capacity.Specify a base-target resin or impregnated adsorbent and evaluate it against the measured ammonia and amine mixture.
An apparently dry filter can lose useful life quickly at the wrong humidity.Include the operating humidity and temperature envelope in media selection and monitor downstream base concentration for breakthrough.

利用可能なオプション

Confirm base species, challenge level, target outlet, media chemistry, face size, header type, system position, airflow, humidity range and replacement-monitoring strategy.

Planning a Targeted Molecular Chemical Filter Base AMC specification?

寸法、設置条件、性能目標、必要な表面仕上げをお送りください。

チームに相談する
メール送信 WhatsApp WeChat

ホーム

製品

ニュース

会社概要

お問い合わせ