STjh targeted molecular filter for basic gases main view

STJH-TARGETED-MOLECULAR-FILTER-BASES

Targeted Molecular Chemical Filter Base AMC

A base-selective cleanroom header filter for ammonia and amines in lithography and other sensitive processes.

Ammonia and amine control
Base-selective adsorbent
Low-outgassing cleanroom format

Введение продукции

This model is organized around airborne bases, particularly ammonia and amines, rather than VOC or acid duty. Base-target ion-exchange resin or an appropriately impregnated adsorbent is held in a pleated cleanroom-compatible structure inside a metal header frame. The configuration suits make-up and recirculation air serving processes where very low base levels matter. Media capacity is site-dependent, so the inlet challenge and required end-of-life removal level should be established before sizing.

Основные характеристики

Base-specific capture path

Ion-exchange or impregnated media is chosen for ammonia and amines, avoiding the poor selectivity that can result from using untreated general-purpose carbon.

Pleated high-area construction

Embedding the chemical media in a structured nonwoven creates working surface area in a compact headered element for common AHU sections.

Sensitive-process compatibility

Controlled outgassing and particle release support placement upstream of critical final filters in semiconductor clean-air systems.

Технические параметры

Primary Contaminant Class	Ammonia, amines and basic AMC
Adsorbent	Base-target ion-exchange resin or impregnated adsorbent
Media Construction	Pleated embedded-adsorbent nonwoven
Frame Format	Metal header filter
Installation Position	Make-up-air or recirculation-air unit
Access Compatibility	Front-loaded or side-access housing
Cleanliness Attributes	Low-outgassing, high-cleanliness components
Downstream Protection	Compatible with separately specified HEPA or ULPA stage
Service-Life Basis	Base concentration, humidity, airflow and end-point efficiency
Customization	Доступно в зависимости от предполагаемого применения и операционной среды.

Applications

Selected for photolithography, reticle handling and other semiconductor spaces where ammonia or amines can change resist chemistry or contaminate surfaces. It can also serve clean chemical areas after the specific base challenge has been characterized.

Solutions for Your Application

A VOC-grade carbon element may offer inadequate ammonia capacity.Specify a base-target resin or impregnated adsorbent and evaluate it against the measured ammonia and amine mixture.

An apparently dry filter can lose useful life quickly at the wrong humidity.Include the operating humidity and temperature envelope in media selection and monitor downstream base concentration for breakthrough.

Доступные варианты

Confirm base species, challenge level, target outlet, media chemistry, face size, header type, system position, airflow, humidity range and replacement-monitoring strategy.

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