STJH-AMMONIA-AMC-FILTER-592X592X287

Ammonia Removal Filter 592 × 592 × 287 mm Semiconductor AMC

A full-size hybrid-adsorbent module for controlling airborne bases in semiconductor facility air.

2000 cfm facility-air duty
Base-target hybrid adsorbent
110 Pa initial resistance

商品紹介

This 592 x 592 x 287 mm facility filter is configured around a hybrid chemical adsorbent selected for bases such as ammonia. The 2000 cfm duty and 2.54 m/s reference face velocity suit full-size make-up or return-air banks, while the published 110 Pa initial resistance remains practical for a dedicated AMC stage. Unlike a general activated-carbon filter, this model is directed at base-sensitive processes and must be sized from measured ammonia loading, humidity and the required protection interval.

主要な特徴

Ammonia-directed media

The hybrid adsorbent chemistry is selected for basic contaminants rather than relying on untreated carbon alone.

Full-module airflow

A 592 mm-square face handles 2000 cfm in a standard full-size chemical-filter bank.

Facility-scale construction

The 287 mm depth provides useful media volume for make-up and recirculation systems protecting sensitive process areas.

技術的なパラメータ

Dimensions	592 x 592 x 287 mm
Target Contaminant	Bases such as ammonia
Rated Airflow	2000 cfm
Reference Face Velocity	2.54 m/s
Initial Pressure Drop	110 Pa at 2.54 m/s
Media Type	Application-specific hybrid chemical adsorbent blend
Nominal Weight	14.5 kg
Installation Stage	Make-up-air or return-air molecular filter bank
Service Basis	Contaminant loading and breakthrough monitoring
カスタマイズ	意図したアプリケーションと動作環境に基づいて利用できます。

Applications

Designed for semiconductor make-up-air and return-air handlers serving ammonia-sensitive lithography, coating and inspection zones. It can also support other controlled processes where airborne bases threaten product yield or optical surfaces, provided media selection follows actual contaminant measurements.

Solutions for Your Application

A broad carbon stage does not hold ammonia long enough to protect a sensitive process.Use the base-target hybrid blend and establish the replacement point from measured inlet and outlet ammonia rather than odor or pressure drop.

The added molecular stage consumes more fan static than the air handler can provide.Check the 110 Pa clean resistance at the stated face velocity and enlarge the active face area when lower system resistance is required.

利用可能なオプション

Confirm ammonia concentration, humidity, design airflow, bank dimensions, upstream particle filtration, monitoring method and required change interval.

Planning a Ammonia Removal Filter 592 × 592 × 287 mm Semiconductor AMC specification?

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