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STJH-AMC-CHEMICAL-FILTER-FFU-BASE

Chemical Filter Fan Filter Unit Base-Gas AMC

A base-targeted chemical filter stage for controlling ammonia and amines ahead of an FFU.
  • Targets ammonia and amines
  • Impregnated activated-carbon panel
  • 30-70% RH cited media-family range
見積もりリクエスト 製品案内

商品紹介

This chemical-filter FFU configuration is designed around alkaline airborne molecular contaminants, especially ammonia and amines. An impregnated activated-carbon panel is installed upstream of the fan filter unit so base-gas adsorption occurs before particle filtration. The cited molecular-filter family uses a 30-70% RH operating range, which makes humidity control an important part of media selection and service planning.

主要な特徴

Base-specific adsorption

The media chemistry is selected for alkaline contaminants rather than acid gases or broad VOC loading.

Humidity-defined operation

The cited 30-70% RH range provides a clear boundary for evaluating the chemical stage in the actual cleanroom.

Upstream panel integration

The panel sits before the FFU, allowing molecular control to be combined with the downstream particle filter.

技術的なパラメータ

Target ContaminantsAmmonia and amines
Chemical MediaImpregnated activated carbon selected for base gases
Chemical Filter FormReplaceable panel filter
Installation PositionUpstream of the FFU
Reference Humidity Range30-70% RH for the cited molecular-filter family
Final Particle FilterHEPA or ULPA selected for the application
Airflow DirectionBase-gas media to FFU to final particle filter
Media Selection BasisMeasured alkaline AMC profile and airflow duty
Housing InterfaceSealed panel frame matched to the FFU
カスタマイズ意図したアプリケーションと動作環境に基づいて利用できます。

Applications

Intended for photoresist processing, lithography support and precision microelectronics areas where ammonia or amines can alter process chemistry. The room humidity and contaminant profile should be reviewed because adsorption performance and service life depend on both.

Solutions for Your Application

Trace ammonia can affect a process even when the particle count remains acceptable.Use a base-targeted impregnated-carbon stage ahead of the final high-efficiency filter.
Media performance may change outside its intended humidity window.Verify that the supply air remains within the cited 30-70% RH range and plan replacement from monitored conditions.

利用可能なオプション

Specify the alkaline contaminant profile, media chemistry, panel depth, FFU adaptor, final filter and service access. Confirm performance for the real humidity, temperature and airflow conditions.

Planning a Chemical Filter Fan Filter Unit Base-Gas AMC specification?

寸法、設置条件、性能目標、必要な表面仕上げをお送りください。

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