Base-specific chemistry
The impregnation is selected to retain basic gases that untreated carbon may hold poorly.
This carbon formulation is impregnated for basic contaminants, particularly ammonia and amines. It can be incorporated into a pleatable nonwoven for compact filters or used as loose fill where a deeper reaction bed is required. Low-outgassing options suit semiconductor environments, but media quantity and replacement timing must be calculated from the measured base load because pressure drop does not indicate chemical exhaustion.
The impregnation is selected to retain basic gases that untreated carbon may hold poorly.
Pleatable sheet supports low-profile filters while pellets provide larger chemical inventory.
Cleanroom-oriented carrier and adsorbent choices reduce unnecessary emissions near lithography areas.
| Adsorbent | Base-target impregnated activated carbon |
|---|---|
| Target Contaminants | Ammonia and amines |
| Media Format | Embedded pleatable nonwoven or loose fill |
| Capture Method | Gas-specific chemisorption |
| Cleanliness | Low-outgassing option |
| Selection Basis | Application-specific base load |
| Humidity Factor | Included in service-life calculation |
| Conversion | Panel, compact cartridge or deep-bed cell |
| Change Criterion | Base-gas breakthrough or calculated capacity |
| カスタマイズ | 意図したアプリケーションと動作環境に基づいて利用できます。 |
For semiconductor lithography, coating and other clean processes where airborne ammonia or amines can affect yield or product surfaces.
Confirm ammonia and amine profile, impregnation, media loading, format, carrier cleanliness, humidity, airflow and monitoring method.
寸法、設置条件、性能目標、必要な表面仕上げをお送りください。