STjh compact semiconductor tool AMC filter main product view

STJH-AMC-FILTER-SEMICONDUCTOR-TOOL

AMC Filter for Semiconductor Cleanrooms Process-Tool

A compact high-cleanliness chemical cell for local AMC control at process tools and mini-environments.

Tool-level AMC control
Over 95% source-test removal
Custom contaminant blends

Introdução do produto

This tool-level model places application-specific adsorbent close to the protected equipment rather than in a central facility air handler. The compact cell can be configured for critical acids, bases or organics and is suited to lithography, etch, metrology and reticle-storage environments. Published source data supports greater than 95% removal in a single filter cell under the stated test conditions; actual selection still requires the target gas list, face velocity, mounting envelope and required end-of-life efficiency.

Características-chave

Point-of-use placement

Mounting near the tool or mini-environment shortens the protected air path and isolates equipment from contaminants not fully controlled by the central system.

Single-cell treatment

The compact chemical cell is designed for high removal without requiring a deep multi-stage facility bank, subject to the stated operating conditions.

Process-specific media

Adsorbent blends can focus on the acids, bases and organics that affect the particular exposure, etch, metrology or storage step.

Parâmetros técnicos

Installation Position	Process tool, mini-environment or local equipment interface
Target Contaminants	Critical acids, bases and organics
Media	Application-specific high-performance adsorbent blend
Removal Reference	Over 95% in a single cell under stated source test conditions
Casing	Clear anodized aluminum
Cover Screens	Clear anodized aluminum with polyester scrim
Gasket	Closed-cell polyethylene
Operating Temperature	18-35 C source reference
Operating Humidity	30-70% RH source reference
Customização	Disponível com base na aplicação pretendida e no ambiente operacional.

Applications

For local protection of photolithography, wet or dry etch, metrology, reticle storage and other semiconductor tools that have a defined AMC sensitivity. Validate the final element at the actual mounting velocity and temperature-humidity envelope.

Solutions for Your Application

Facility AMC levels can meet the room target while a sensitive tool still sees local contamination.Add a tool-level cell at the equipment air interface and select its media from the contaminants measured or released near that process.

A high-removal cell may cause uneven airflow across the tool intake.Confirm face velocity, downstream clearance and distribution at the complete installed interface rather than judging the filter by nominal size alone.

Opções disponíveis

Provide tool envelope, mounting pattern, airflow, target AMC list, inlet concentration, outlet requirement, gasket geometry, media blend and local monitoring point.

Planning a AMC Filter for Semiconductor Cleanrooms Process-Tool specification?

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