STjh semiconductor make-up-air AMC filter main product view

STJH-AMC-FILTER-SEMICONDUCTOR-MUA

AMC Filter for Semiconductor Cleanrooms Make-Up-Air

A high-flow facility AMC filter configured to intercept outdoor and site molecular contaminants in semiconductor make-up air.

Make-up-air installation
Site-specific hybrid media
Capacity tracked in ppb-h

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Product Introduction

Installed in the make-up-air unit, this facility filter treats the outside-air fraction before it enters cleanroom circulation. Its hybrid adsorbent blend is selected for the site's acids, bases or organics, and chemical capacity is expressed in ppb-h so expected life can be related to measured inlet concentration. The MUA role emphasizes broad environmental loading and large airflow; it differs from a return-air model focused on internally generated emissions or a compact filter mounted near a process tool.

Key Features

Outdoor challenge interception

Placement in the MUA section addresses acids, bases and organics entering with ventilation air before they reach sensitive recirculation loops.

Concentration-based life planning

A ppb-h capacity framework lets the maintenance plan use measured AMC concentration and a chosen end-of-life removal threshold rather than a generic calendar interval.

Facility-scale configuration

The filter format is intended for high-flow air-handler sections and can be matched to common facility rack dimensions and access arrangements.

Technical Parameters

System Position	Semiconductor make-up-air unit
Contaminant Options	Strong and weak acids, bases and organics
Media	Application-specific hybrid adsorbent blend
Capacity Metric	ppb-h chemical capacity
Airflow Duty	High-flow facility application
Filter Format	AHU-compatible facility chemical filter
Selection Input	Measured outdoor and site AMC concentration
End-of-Life Basis	Specified remaining removal efficiency
Particle Stages	Separate prefilter and final HEPA or ULPA as required
Customization	Available based on the intended application and operating environment.

Applications

For fab make-up-air systems protecting lithography, deposition, etch and metrology areas from site and outdoor AMC. The media blend should be chosen from monitored inlet data, seasonal humidity and the contaminants that drive process risk.

Solutions for Your Application

Outdoor AMC varies by season and nearby industrial activity, making a fixed media choice unreliable.Profile MUA inlet acids, bases and organics across representative periods, then allocate adsorbent capacity to the dominant risk.

A high-capacity chemical stage could exceed the make-up fan's pressure allowance.Check the complete clean and loaded system resistance at design airflow and size the filter face area before releasing the bank layout.

Available Options

Define monitored gas list, ppb ranges, target outlet, airflow, face dimensions, media blend, rack access, particulate protection and breakthrough alarm strategy.

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