Acid-compatible workspace
Polypropylene wetted and structural surfaces suit common cleanroom acid and alkaline process stations when confirmed against the chemical list.
The chemically resistant polypropylene body separates this model from solvent-oriented stainless stations. Its 1830 x 610 mm work deck accommodates manual tanks and rinsing positions, with lip and rear extraction arranged to capture corrosive vapor close to the process while leaving the operator direct control of immersion timing and sequence.
Polypropylene wetted and structural surfaces suit common cleanroom acid and alkaline process stations when confirmed against the chemical list.
Tank lip extraction and rear exhaust pull fumes away from the operator near their point of release.
Operators can change tank sequence, dwell time and prototype recipe without programming a robotic transfer system.
| Nominal Work Width | 1830 mm |
|---|---|
| Nominal Work Depth | 610 mm |
| Construction Material | Chemical-resistant polypropylene |
| Chemistry Service | Acid and base processes subject to compatibility review |
| Exhaust Arrangement | Rear plenum and tank lip exhaust |
| Exhaust Monitoring | Differential airflow gauge interlocked with EPO |
| Operator Protection | Counterbalanced PVC safety shield available |
| Standard Utilities | DI water spray and PTFE nitrogen gun |
| Process Format | Manual tanks, rinse modules and open deck positions |
| カスタマイズ | Tank layout, plumbing, exhaust volume, utility connections and safety controls can be configured for the chemistry and operating environment. |
RCA cleaning, KOH etching, buffered oxide etching, plating, megasonic cleaning and prototype wafer processing with acid or alkaline chemistry.
Quick-dump rinse, quartz or PTFE tanks, ultrasonics, HEPA fan-filter supply, dedicated carboy drains, lift station, shield design, lighting and utility manifold may be added.
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