STjh acid-gas AMC chemical-filter FFU with deep impregnated-carbon cassette above the final filter

STJH-AMC-CHEMICAL-FILTER-FFU-ACID

Chemical Filter Fan Filter Unit Acid-Gas AMC

An FFU-mounted acid-gas adsorbent stage for molecular-contamination-sensitive clean processes.

Acid-gas-targeted adsorbent
Impregnated activated-carbon media
Upstream chemical stage with HEPA or ULPA final filtration

Introduction de produit

This AMC configuration places an acid-targeted impregnated activated-carbon panel upstream of the fan filter unit's HEPA or ULPA final stage. The chemical media is selected for acidic molecular contaminants rather than alkaline gases or general organic vapours. It is intended for lithography and microelectronics zones where particle control alone does not address airborne chemical species that can affect surfaces or process chemistry.

Key Features

Acid-selective media duty

The adsorbent formulation is chosen for acidic molecular contaminants instead of treating every gas with one generic carbon stage.

Two-stage contamination strategy

Chemical adsorption occurs before the downstream high-efficiency particle filter, separating molecular and particulate control functions.

FFU-compatible panel format

The AMC panel mounts above the fan filter unit so it can be integrated into a ceiling or mini-environment supply path.

Paramètres techniques

Target Contaminants	Acid gases
Chemical Media	Impregnated activated carbon selected for acidic AMC
Chemical Filter Form	Replaceable panel stage
Installation Position	Above and upstream of the FFU
Final Particle Filter	HEPA or ULPA
Airflow Direction	Chemical media to FFU to final particle filter
Media Selection Basis	Site contaminant profile and required removal duty
Replacement Basis	Scheduled from exposure history or monitored chemical-filter condition
Housing Interface	Adaptor or frame matched to the selected FFU footprint
Customisation	Disponible en fonction de l'application prévue et de l'environnement d'exploitation.

Applications

Suitable for semiconductor lithography, microelectronics coating and other processes vulnerable to acidic airborne molecular contamination. Media selection and replacement interval should be based on the actual contaminant species, concentration, humidity and airflow rather than particle-class targets alone.

Solutions for Your Application

HEPA filtration controls particles but does not remove acidic molecular contaminants.Install the acid-targeted impregnated-carbon stage upstream of the final particle filter.

Using an unspecified carbon panel may provide poor removal for the actual acid species.Select the media from a site AMC profile and size the panel for the required residence time and replacement strategy.

Options disponibles

Define the target acid gases, FFU footprint, final HEPA or ULPA grade, media depth, sealing frame and replacement access. Performance should be confirmed for the real concentration, humidity and airflow conditions.

Planning a Chemical Filter Fan Filter Unit Acid-Gas AMC specification?

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