Largest reactive-media charge
The extended cylinder increases base-target adsorbent inventory for demanding ammonia duty or longer scheduled operating periods.
This 148 x 595 mm cartridge is the high-capacity alkaline-gas option for full-size molecular banks. Sixteen cylinders support 3400 m3/h at an initial 175 Pa, providing the greatest airflow and adsorbent inventory in the three-model base series. The deeper shell is appropriate for longer service or heavier ammonia and amine challenges, provided the AHU has sufficient static pressure and nearly 600 mm of withdrawal clearance.
The extended cylinder increases base-target adsorbent inventory for demanding ammonia duty or longer scheduled operating periods.
Sixteen units fill a 610 mm square opening and pass 3400 m3/h, supporting large return-air and make-up-air applications.
The stated pressure drop, humidity window and service depth help buyers evaluate the real tradeoff between capacity and system burden.
| Cylinder Dimensions | 148 mm diameter x 595 mm length |
|---|---|
| Rated System Airflow | 3400 m3/h per 16 cylinders |
| Initial Pressure Drop | 175 Pa at rated system airflow |
| Adsorbent | Base-target impregnated media |
| Target Contaminants | Ammonia and amines |
| Cylinder Construction | ABS molecular cartridge |
| Cylinders per 610 x 610 mm Opening | 16 |
| Optimum Relative Humidity | 40-90% RH for base-media family |
| Optimum Temperature | 10-60 C for base-media family |
| Customisation | Disponible en fonction de l'application prévue et de l'environnement d'exploitation. |
For high-volume AHUs serving ammonia-sensitive lithography, semiconductor return air or other clean processes with sustained base loading. Its capacity advantage should be verified against fan reserve, access space and the required downstream AMC limit.
Select base-media formulation, access orientation, holding frame, environmental range, prefiltration, gas monitoring, spare strategy and high-load staging if required.
Envoyez-nous vos dimensions, conditions d'installation, objectifs de performance et finition de surface requise.