Critical-zone particle barrier
U17 efficiency targets the most sensitive semiconductor operations rather than general cleanroom coverage.
This full-module panel pairs the highest U17 efficiency in the series with a reverse gel interface and 35 mm boron-free ePTFE pack. It is meant for critical process zones where the reduction in particle penetration outweighs higher system resistance. Because the external face remains similar to lower grades, purchasing records should state U17 acceptance, gel orientation and test airflow unambiguously.
U17 efficiency targets the most sensitive semiconductor operations rather than general cleanroom coverage.
The reverse gel trough surrounds the full face and supports repeatable blade engagement in a compatible grid.
Spunbond layers on both sides of the ePTFE membrane help protect the high-grade pack from handling stress.
| Nominal Face Size | About 610 x 610 mm |
|---|---|
| Efficiency Class | U17 |
| Minimum Efficiency | 99.999995% at MPPS |
| Filter Media | Boron-free supported ePTFE |
| Media Pack Depth | 35 mm |
| Frame Material | Anodized aluminum |
| Seal Type | Reverse gel channel |
| Nominal Initial Resistance | 0.55 in. w.g. at 100 fpm |
| Loading Method | Compatible room-side gel grid |
| التخصيص | متوفر على أساس التطبيق المقصود وبيئة التشغيل. |
Applied locally in leading-edge semiconductor process bays, tool mini-environments and critical metrology spaces where U17 is explicitly required. It should be integrated with sufficient fan reserve and a grid designed for the reverse gel configuration.
Specify finished dimensions, overall frame series, gel location, faceguard material, divider or test ports and required airflow test point.
أرسل لنا الأبعاد الخاصة بك، شروط التثبيت، أهداف الأداء والتشطيب السطحي المطلوب.