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Воздушные фильтры и химическая фильтрация
Фильтр AMC для полупроводниковых чистых помещений
A low-outgassing pleated molecular panel formulated to control airborne acids, bases, VOCs or selected dopants in semiconductor cleanrooms and process equipment.
- Semiconductor AMC Control
- Low-Outgassing Components
- Targeted Pleated Adsorbents
- FFU-Compatible Panel
Введение продукции
The AMC filter for semiconductor cleanrooms embeds activated carbon, ion-exchange resin or chemically modified adsorbent within a clean pleated support. The resulting panel provides substantially more active area than a flat granular screen while keeping the shallow depth required by fan filter units, return-air modules and process tools. Different media layers can target volatile organics, acids, bases or selected dopant compounds. Low-outgassing frame, separator, gasket and potting materials help the finished filter operate near contamination-sensitive wafer, display and storage processes.
Основные характеристики
Media chemistry can be selected for VOC, acid, base or dopant contamination rather than using one universal carbon grade.
Low-outgassing support and frame materials reduce the filter assembly's own contribution to the clean environment.
Clean retaining layers limit adsorbent particle shedding toward downstream HEPA or ULPA media.
Решения для вашего приложения
Molecular contamination can alter wafer surfaces or corrode process hardware even when the cleanroom already meets its particulate classification.
Particle filters do not remove airborne acids, bases or volatile organic molecules.Embedded molecular adsorbents capture or react with the selected gas family before it reaches the process.
One broad-spectrum carbon grade cannot address multiple semiconductor AMC groups equally.Separate acid, base, VOC and dopant media layers can be arranged for the identified contaminant profile.
Loose chemical pellets shed dust toward a downstream ULPA terminal.Pleated embedded media and clean support scrims contain the adsorbent within the panel structure.
A deep chemical bed will not fit an FFU or process-tool return module.The high-area pleated panel provides a compact AMC stage in standard shallow cleanroom dimensions.
Типичные приложения
Semiconductor wafer cleanroomsLithography and coating process toolsFlat-panel and OLED manufacturingChemical-sensitive storage cabinetsFFU and recirculation-air AMC stages
Технические параметры
Typical construction ranges for a low-outgassing semiconductor AMC panel are listed below.
| Основной материал | Pleated activated-carbon, ion-exchange or chemically impregnated adsorbent embedded in a low-outgassing support |
|---|---|
| Толщина панели | 25–100 mm overall cleanroom-panel depth |
| эффективная ширина | 305-610 мм номинальная ширина грани |
| Максимальная длина | Номинальная длина лицевой стороны до 1220 мм |
| Толщина линий стали | 0.4–0.6 mm low-shedding stainless or coated retaining grid when specified |
| Плотность ядра | Approximately 60–180 kg/m³ equivalent embedded-adsorbent media density |
| Теплопроводимость | Approximately 0.040–0.090 W/(m·K) for the dry pleated adsorbent composite |
| Поверхностная отделка | Natural anodized aluminium or clean low-outgassing polymer frame |
| Объединенный тип | Flat gasket, gel-compatible perimeter or clip-in FFU cassette connection |
| Customization | Доступно в зависимости от предполагаемого применения и операционной среды. |
Доступные варианты
VOC-targeted activated carbonAcid-gas chemisorption mediaAmmonia and amine ion-exchange mediaSingle-layer or multi-layer AMC cassette
Planning a AMC Filter for Semiconductor Cleanrooms specification?
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